Synthesized from water glass as raw material, suitable for preparing grinding and polishing liquids. The product has a uniform particle size distribution, good particle integrity, and high hardness.

Product Description

Used to prepare CMP polishing solution for polishing products such as silicon wafers, hard disk drives, glass, lenses, and metal surfaces.

Product Data
Model
NN-4040
Product Attributes
Solid Content38%-42%
Acid-baseBasicity
Main IngredientSilicon Oxide
Precautions

Storage conditions: Avoid direct sunlight, store at a temperature of 0-40 ℃. If it is below 0 ℃, it will produce jelly and be scrapped;

Warranty: 1 year;

Attention: Avoid prolonged exposure to air;

Package: packed in IBC ton drums.