Product Description
1. Polishing: Can be used to prepare CMP polishing solution for high gloss polishing and planarization of products such as silicon, copper, SIC, GAN, aluminum alloys, stainless steel, ceramics, etc;
2. Coating: Various particle sizes and modified silica sol can be used to prepare coatings for different systems.
Product Data
| Model | NN-40100 |
| Product Attributes | |
|---|---|
| Solid Content | 38%-42% |
| Acid-base | Basicity |
| Main Ingredient | Silicon Oxide |
Precautions
Storage conditions: avoid exposure to the sun. The storage temperature is 0-40 ℃. If it is lower than 0 ℃, gel will be produced and discarded;
Warranty: 1 year;
Attention: Avoid prolonged exposure to air;
Package: packed in IBC ton drums.
