Home - Product - CMP Polishing Fluid - SIC-3000WD

Prepared from diamond as raw material, suitable for the fine grinding process of SiC materials, PH value is alkaline, and used with polyurethane polishing skin.

Product Description

1. This product is suitable for the fine grinding process of SiC materials;

2. The abrasive is uniformly suspended and has good dispersion;

3. Recycling is not recommended.

Product Data
ModelSIC-3000WD
Product Attributes
Solid Content<10%
Acid-baseBasicity
Main IngredientAdamas

Application Scenarios

Grinding

Processing Materials

SiC



Precautions

Storage conditions: Indoor storage, choose a cool place, and the temperature is controlled between 0°C-40°C;

Warranty: The shelf life under storage conditions is 6 months;

Attention: Please store in shading conditions, otherwise it will affect the shelf life of the product;

Packing specifications: 5kg/drum, 4 drums/carton.